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For full functionality of our forum it is necessary to enable Javascript in your browser. If you're not sure about how to do this you will find easy to understand instructions at: http://www.enable-javascript.com1. Field of the Invention
The present invention relates to a semiconductor integrated circuit, and more particularly to a structure of a semiconductor integrated circuit having circuit cells of a single poly type and a manufacturing method of the semiconductor integrated circuit.
2. Description of the Related Art
In a conventional semiconductor integrated circuit, a supply voltage is supplied to circuits mounted on the circuit forming surface of a semiconductor substrate. A supply voltage to the circuits on the circuit forming surface is supplied through a polysilicon layer to be generally called polysilicon layer.
A method for manufacturing a semiconductor integrated circuit having polysilicon layer in the conventional art will be described below.
After forming a gate oxide film and a gate electrode of a transistor forming a polysilicon layer on a first conductive region in a semiconductor substrate, by a well known method, a resist pattern for forming a gate electrode is formed on the gate electrode. An impurity element of high conductivity is introduced into the well region with the gate electrode as a mask.
Thereafter, the resist pattern is removed and then an inter-layer dielectric film is formed on the entire surface. Subsequently, the inter-layer dielectric film is etched to form a contact hole. A second conductive layer is formed in the contact hole. A resist pattern for forming a gate electrode is formed on the second conductive layer.
An impurity element of high conductivity is introduced into the well region with the gate electrode as a mask. Further, an impurity element of high conductivity is introduced into the second conductive layer of the contact hole with the gate electrode and the well region as a mask. Thereafter, the second conductive layer and the first conductive region are connected to each other by a silicide layer.
In this way, a polysilicon layer and a silicide layer are formed in the semiconductor integrated circuit having a conventional structure.
I did ofc. I also installed it and It works i just wanted to know this beforehand. For people who havent had any version of serum before these folders just dont exist and the instructions are kind of misleading.
Ok yeah for those who have v1 or older the add-on folder DOES exist in the same folder as serum and all u need to do is add the module path after the serum folder, which I did at first so I could play HL2 then... But then after installing this new version I saw the folder like in the screenshot above and I wanted to add the path manually - which is what I want to do, because it seems to be the idea behind the addon to let people install it as an add-on, and not something that has to be in the same folder as serum... 827ec27edc